T6 Oxide Heterostructures

Oxide Thin Films and Heterostructures


Registration Fee per Tutorial:

  • Meeting Attendee (Virtual or In-Person): $140
  • Students: $75
  • Non-meeting Attendee: $150

Who Should Attend?

Graduate students, post-docs, and other scientists interested in the rich electric and magnetic phenomena found in thin complex oxide films and heterostructures.

Tutorial Description

Advances in deposition technologies and substrates have enabled the growth of oxide thin films with high structural perfection and customized oxide layering, down to the atomic layer level. This has allowed the creation of complex oxide films and heterostructures with correlated 2D electron gases and electron liquids at the interfaces of large bandgap polar and non-polar oxide layers. These systems display a host of exciting phenomena including ferroelectric, ferromagnetic and multiferroic textures. The control of such textures may lead to new technologies. These tutorials will cover the techniques, challenges, and approaches to the controlled synthesis of oxide films and heterostructures, the nature of the electronic system formed at their interfaces, and the novel topological excitations they allow.


  • Oxide Films and heterostructure fabrication: Adapting existing thin film deposition techniques to the challenges of functional oxides, including pulsed-laser deposition, high-pressure and off-axis sputtering, reactive co-evaporation, and reactive molecular-beam epitaxy (MBE); the techniques, challenges, and approaches to the controlled synthesis of oxide films and heterostructures with a primarily focus on their growth by MBE.
  • 2D electron gas at Oxide interfaces: the role of charge transfer, interface mixing, and oxygen vacancies in creating metallicity; origin of magnetic effects; the role of the interfaces on the metallic sub-bands of titanium atoms; large spin-orbit interactions and enhanced Rashba effects at interfaces; implications for spintronic devices
  • Ferroelectrics- Fundamentals and recent developments: controlled growth of epitaxial layers via epitaxial synthesis techniques; problems of polarization degradation and their solution; multiferroic materials (e.g. BiFeO3) and more recently non-lead-based ferroelectrics (e.g. Zr doped hafnium oxide); polar textures (e.g. vortices) in ferroelectric oxide superlattices; electrical control of texture chirality and negative permittivity.
  • Topological spin states in Oxides: antiferromagnetic oxides in the so-called A-type magnetic structure, (e.g. hematite); the Dzyaloshinskii-Moriya interaction, Neel and Morin transitions, topological textures (merons, antimerons, bimerons and skyrmions), and their control by cycling temperature over a narrow range; imaging textures via X-PEEM, transmission X-ray microscopy and N-V centre microscopy; combined weak ferromagnetism atop antiferromagnetic textures, adding net magnetic degrees of freedom that might include emergent magnetic monopoles; methods to control the chirality of the topological textures and to propel them via the spin Hall effect; the implications for beyond-CMOS devices, including classical and possibly quantum information processing.


  • T. Venkatesan, CQRT, University of Oklahoma


  • Darrell Schlom, Cornell University
  • Jochen Mannhart, Max Plank Institute for Solid State Research, Stuttgart, Germany
  • Ramamoorthy Ramesh, University of California, Berkeley
  • Paolo G. Radaelli, University of Oxford